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31 August 2005 Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
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X-ray focusing techniques using Kirkpatrick and Baez mirrors are promising due to their capability of highly efficient and energy-tunable focusing. We have been developing a hard-X-ray focusing system using K-B mirrors for an X-ray microscope. Here, we report the development of a mirror manipulator and focusing tests using the manipulator. Mirror alignment tolerances were estimated using two types of simulators: a ray-trace simulator and a wave-optical simulator. On the basis of the simulation results, the mirror manipulator was developed achieving optimum K-B mirrors setup. The focal size was achieved to be 48 x 36nm2 (V x H) in FWHM at 1km long beamline of SPring-8. The obtained spatial resolution test results indicate that a scanning microscope with the focused beam can resolve the line-and-space patterns of 80nm line width in a high visibility of 60%.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 591804 (31 August 2005);

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