31 August 2005 Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications
Author Affiliations +
Abstract
In this work we have studied the generation of Extreme Ultraviolet (EUV) light by a novel Compact Electron Cyclotron Resonance Ion Source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m Grazing Incidence Monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xeq+ (q = 1-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for Xenon in the 10-80 nm range under absolute conditions to create a database for further investigations. High resolution spectra were recorded confirming fair contributions from highly excited Xe10+ and Xe9+ ionic states. Major outcome of this work is that the Xe10+ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Merabet, H. Merabet, R. Bista, R. Bista, C. Schubert, C. Schubert, S. Fuelling, S. Fuelling, R. Bruch, R. Bruch, A. L. Godunov, A. L. Godunov, } "Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180E (31 August 2005); doi: 10.1117/12.613983; https://doi.org/10.1117/12.613983
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Performance of new high-power HVM LPP-EUV source
Proceedings of SPIE (March 17 2016)
Progress toward use of a dense plamsa focus as a...
Proceedings of SPIE (August 19 2001)
Discharge produced plasma source for EUV lithography
Proceedings of SPIE (April 11 2007)
High-power laser plasma EUV light source for lithography
Proceedings of SPIE (September 19 2004)

Back to Top