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31 August 2005 Compact source and beam delivery system for EUV radiation using a Schwarzschild objective
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In order to generate high energy densities of 13.5 nm radiation, an EUV Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The spherical mirror substrates were coated with Mo/Si multilayers systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40 % at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm, plasma diameter approx. 300 μm), energy densities of 73 mJ/cm2 at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F2, F3 and F3+ color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 μm diameter was generated, which accomplishes direct writing of color centers with μm resolution.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Mann, F. Barkusky, A. Bayer, C. Peth, H. Toettger, T. Feigl, and N. Kaiser "Compact source and beam delivery system for EUV radiation using a Schwarzschild objective", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180F (31 August 2005);

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