31 August 2005 EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma
Author Affiliations +
Abstract
A CO2 laser driven Xe jet plasma is presented as light source system for EUV lithography. A short-pulse TEA C02 master oscillator power amplifier system and a pre-pulse Nd:YAG laser were used for plasma generation. The dependence of EUV plasma parameters, e.g. conversion efficiency, plasma image and in-band and out-of-band spectra, on the delay time between the pre-pulse and the main pulse laser was investigated. A maximum conversion efficiency of 0.6 % was obtained at a delay time of about 200 ns. In addition, characteristics of fast ions were measured by the time-of-flight method. The peak energy of the fast ion energy distribution decreased significantly at delay times larger than 200 ns. This result is very promising with respect to collector mirror lifetime extension by magnetic field mitigation.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Komori, Hiroshi Komori, Yoshifumi Ueno, Yoshifumi Ueno, Hideo Hoshino, Hideo Hoshino, Tatsuya Ariga, Tatsuya Ariga, Akira Endo, Akira Endo, } "EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180H (31 August 2005); doi: 10.1117/12.616051; https://doi.org/10.1117/12.616051
PROCEEDINGS
8 PAGES


SHARE
Back to Top