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16 September 2005 Comparisons between EUV at-wavelength metrological methods
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Abstract
Comparisons between several at-wavelength metrological methods are reported. The comparisons are performed by measuring one test optic with several kinds of measurement methods from the viewpoints of accuracy, precision and practicality. According to our investigation, we found that the PDI, the LDI, and the CGLSI are the most suitable methods for evaluating optics for EUV lithography.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, and Mitsuo Takeda "Comparisons between EUV at-wavelength metrological methods", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210D (16 September 2005); https://doi.org/10.1117/12.616676
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