Translator Disclaimer
26 August 2005 Improvement to silver superlens performance through narrowband exposure
Author Affiliations +
Abstract
A performance enhancement to planar lens lithography (PLL) through the use of i-line narrowband exposures has been investigated. Experimental results show that for a 50nm silver layer the image fidelity of narrowband exposures out performs broadband exposures. This is due to the removal of off-plasmonic-resonance wavelengths, which cause unwanted background exposure and a loss of image fidelity. Dense gratings have been resolved down to 145nm periods, as well as line-pairs down to separation distances of 117nm. These results out perform the diffraction-limits that restrict traditional optical-system resolution limits.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. O. S. Melville, R. J. Blaikie, and M. M. Alkaisi "Improvement to silver superlens performance through narrowband exposure", Proc. SPIE 5928, Plasmonic Nano-imaging and Nanofabrication, 592805 (26 August 2005); https://doi.org/10.1117/12.617561
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top