Improvement to silver superlens performance through narrowband exposure

D. O. S. Melville; R. J. Blaikie; M. M. Alkaisi

doi:10.1117/12.617561

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26 August 2005 Improvement to silver superlens performance through narrowband exposure

D. O. S. Melville; R. J. Blaikie; M. M. Alkaisi

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Proceedings Volume 5928, Plasmonic Nano-imaging and Nanofabrication; 592805 (2005) https://doi.org/10.1117/12.617561
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

A performance enhancement to planar lens lithography (PLL) through the use of i-line narrowband exposures has been investigated. Experimental results show that for a 50nm silver layer the image fidelity of narrowband exposures out performs broadband exposures. This is due to the removal of off-plasmonic-resonance wavelengths, which cause unwanted background exposure and a loss of image fidelity. Dense gratings have been resolved down to 145nm periods, as well as line-pairs down to separation distances of 117nm. These results out perform the diffraction-limits that restrict traditional optical-system resolution limits.

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D. O. S. Melville, R. J. Blaikie, and M. M. Alkaisi "Improvement to silver superlens performance through narrowband exposure", Proc. SPIE 5928, Plasmonic Nano-imaging and Nanofabrication, 592805 (26 August 2005); https://doi.org/10.1117/12.617561

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