26 August 2005 Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques
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Abstract
We demonstrate a promising method to fabricate large-area photonic crystals with desired defects by using the combination of interference and multi-photon polymerization techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a negative SU-8 photopolymerizable photoresist is used to form a square or hexagonal twodimensional periodic structure. Arbitrary defects are introduced in these structures by tightly focused (numerical aperture 0.85) 100 fs duration pulses at 830 nm to generate multi-photon polymerization effect. The experimental evidence of 6 mm × 6 mm photonic crystals with the lattice constant as small as 1 μm embedding several kinds of defect proves the concept and shows this technique potentially useful for photonic researches and applications.
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Ngoc Diep Lai, Wen Ping Liang, Jian Hung Lin, and Chia Chen Hsu "Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 593108 (26 August 2005); doi: 10.1117/12.614821; https://doi.org/10.1117/12.614821
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