27 August 2005 Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology
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Abstract
Nano-optic retarders and polarizers based on dielectric and metal nano-gratings were fabricated by UV-nanoimprint lithography. Different from conventional nanostructure-based optical devices, atomic layer deposition, a highly uniform and conformal deposition process, were utilized to fill trenches of the both dielectric and metal nano-gratings. The resulted immersion nano-grating design opens a path for innovative nano-grating based optical devices and integrated optical devices. As an example, a high-performance fully-buried aluminum nanowire-gird polarizer was developed which allowed us to achieve a monolithically integrated visible circular polarizer. The ability to integrate multiple nanostructure-based optical layers opens a path for innovative integrated optical devices as well as a new strategy for driving both miniature and cost.
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Jian Wang, Jian Wang, Xuegong Deng, Xuegong Deng, Paul Sciortino, Paul Sciortino, Ron Varghese, Ron Varghese, Anguel Nikolov, Anguel Nikolov, Feng Liu, Feng Liu, Xiaoming Liu, Xiaoming Liu, Lei Chen, Lei Chen, } "Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310C (27 August 2005); doi: 10.1117/12.615951; https://doi.org/10.1117/12.615951
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