5 October 2005 Ion source characterization based on an array of retarding field analyzers
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Proceedings Volume 5963, Advances in Optical Thin Films II; 59630H (2005); doi: 10.1117/12.625215
Event: Optical Systems Design 2005, 2005, Jena, Germany
Abstract
During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.
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N. Beermann, H. Ehlers, D. Ristau, "Ion source characterization based on an array of retarding field analyzers", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630H (5 October 2005); doi: 10.1117/12.625215; https://doi.org/10.1117/12.625215
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KEYWORDS
Ions

Resolution enhancement technologies

Coating

Plasma

3D metrology

Data centers

Deposition processes

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