Oxide and fluoride coatings for the excimer wavelength 193nm

Rainer Götzelmann; Harro Hagedorn; Alfons Zöller; Alexei Kobiak; Werner Klug

doi:10.1117/12.625152

4 October 2005 Oxide and fluoride coatings for the excimer wavelength 193nm

Rainer Götzelmann, Harro Hagedorn, Alfons Zöller, Alexei Kobiak, Werner Klug

Proceedings Volume 5963, Advances in Optical Thin Films II; 59630L (2005) https://doi.org/10.1117/12.625152
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The requirements to produce high performance coatings increase dramatically when moving from 248 nm to 193 nm. The quality of DUV thin film components is mainly determined by the optical properties of the applied layer materials. The reduction of losses due to scattering and absorption of dielectric materials is essential for excellent properties of the coating results. The most common oxide and fluoride materials SiO₂, Al₂O₃, MgF₂ and LaF₃ have been investigated and optimized. Plasma ion assisted deposition was applied for the deposition of the oxide materials, using improved coating equipment such as the modified APSpro (advanced plasma source). The paper reports the results of DUV coatings using plasma ion assisted deposition for the oxide materials. Single layers of silica and alumina and multilayer systems with both materials were investigated. In addition, MgF₂ and LaF₃, conventionally coated at very high temperatures, have been performed to demonstrate the improved capabilities of the optimized SYRUSpro DUV for DUV applications with all the new features.

Citation Download Citation

Rainer Götzelmann, Harro Hagedorn, Alfons Zöller, Alexei Kobiak, and Werner Klug "Oxide and fluoride coatings for the excimer wavelength 193nm", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630L (4 October 2005); https://doi.org/10.1117/12.625152

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