4 October 2005 Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components
Author Affiliations +
Abstract
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads to extraordinary demands on the optical components involved (high throughput, low scattering, high mechanical stability, ...). Fluorides are the main or even the only candidates for film materials in these spectral regions because of their low absorption. There are several high-index and low-index fluoride materials. These materials, however, may significantly differ in their nanostructural properties leading to scatter losses crucially influencing the performance of the multilayers. In order to find optimal material combinations, HR multilayer mirrors were fabricated using several high-index fluoride film materials. Spectral photometry, atomic force microscopy, as well as total and angle resolved light scattering measurement and analysis were performed for comprehensive characterization.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sven Schröder, Hein Uhlig, Angela Duparré, Norbert Kaiser, "Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630R (4 October 2005); doi: 10.1117/12.624499; https://doi.org/10.1117/12.624499
PROCEEDINGS
10 PAGES


SHARE
RELATED CONTENT

X-ray study of surfaces and interfaces
Proceedings of SPIE (December 10 2001)
Design Of High-Reflectivity Supermirror Structures
Proceedings of SPIE (January 18 1989)
High-resolution carbon/carbon multilayers
Proceedings of SPIE (December 24 2002)
High performance Cr Sc multilayers for the soft x ray...
Proceedings of SPIE (January 13 2004)

Back to Top