5 October 2005 High-rate deposition of optical coatings by closed-field magnetron sputtering
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Abstract
"Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in a wide range of optical applications. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <±1% is accomplished simply using time. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. The CFM configuration also allows plasma treatment of surfaces prior to deposition, allowing optimisation of coating adhesion to substrates such as plastics. This paper presents data on optical, durability and environmental properties for CFM deposited optical coatings, including anti-reflection, IR blocker and colour control and thermal control filters, graded coatings, as well as conductive transparent oxides such as indium tin oxide. Benefits of the CFM sputter process for a range of optical applications are described.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. R. Gibson, I. Brinkley, E. M. Waddell, J. M. Walls, "High-rate deposition of optical coatings by closed-field magnetron sputtering", Proc. SPIE 5963, Advances in Optical Thin Films II, 596318 (5 October 2005); doi: 10.1117/12.624774; https://doi.org/10.1117/12.624774
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