5 October 2005 Properties of chirped mirrors manufactured by plasma ion assisted electron beam evaporation
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Abstract
Nowadays, chirped dielectric mirrors for ultrafast optics and laser applications are usually manufactured by sputtering techniques. The suitability of Advanced Plasma Source (APS) assisted electron beam evaporation with respect to such coatings is still under investigation. The purpose of this presentation is to show our first results of the deposition of chirped layers produced by plasma ion assisted electron beam evaporation and of the investigation of their properties. The aim was to design and prepare a NIR-mirror for the spectral range of 700 nm to 900 nm. It has been attempted to find a design that is robust with respect to errors of thickness and refractive index. The mirror consists of more than 26 layers composed of alternating high- (Nb2O5) and low-refractive index (SiO2) material. The deposited coatings were tested in terms of their group delay dispersion (GDD) and their reflectivity. We show, that in the wavelength range between 720 nm and 890 nm the GDD exhibits a value of about -50 fs2, whereas the reflectivity is above 99%. However, the subsequent reverse engineering operations show a relatively large thickness error of more than 1% - 2% regarding the particular layers. Nevertheless the effect on the GDD and the reflectivity is tolerable. Furthermore, we present our first experiments concerning the design and fabrication of a chirped mirror, which allows controlling the third order dispersion (TOD), whereas the relative thickness error of the particular layers should not exceed 1%.
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Martin Bischoff, Martin Bischoff, Olaf Stenzel, Olaf Stenzel, Dieter Gäbler, Dieter Gäbler, Norbert Kaiser, Norbert Kaiser, } "Properties of chirped mirrors manufactured by plasma ion assisted electron beam evaporation", Proc. SPIE 5963, Advances in Optical Thin Films II, 59631N (5 October 2005); doi: 10.1117/12.624603; https://doi.org/10.1117/12.624603
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