5 October 2005 B4C/Mo/Si multilayers for 20-40 nm wavelengths: application to broadband mirrors
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Abstract
Theoretically, periodic three component multilayers as B4C/Mo/Si allow an improvement of the reflectivity in the 25 nm-40 nm range as compared to two component multilayers as B4C/Si. Optimized B4C/Mo/Si and B4C/Si multilayers have been deposited by magnetron sputtering and ion beam sputtering. The multilayers have been characterized by x-ray grazing reflectometry (λ = 0.154 nm) and synchrotron radiation measurements at near normal incidence. The maximum experimental reflectivity for B4C/Si is 25% at 32 nm and 23% at 38 nm. For B4C/Mo/Si multilayers, we obtained an experimental reflectivity of 34% at 32 nm and 29% at 39.5 nm. Moreover the width of the Bragg peak is larger for B4C/Mo/Si than for B4C/Si. We have used these multilayers in a non periodical structure in order to produce broadband mirrors. It consists of the superposition of two periodic B4C/Mo/Si multilayers with different period thickness. Theoretical optimization of such structure by simulation is presented. Preliminary experimental results demonstrate the interest of such structure : two broadband mirrors have been deposited and measured over a wide wavelength range (12 nm to 45 nm). The first mirror presents a broadband spectrum centered at 32 nm with peak reflectivity of 22% and bandwidth larger than 9 nm. The second mirror has been optimized to produce theoretically an average reflectivity of 19% from 25 nm to 35 nm.
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Franck Delmotte, Franck Delmotte, Julien Gautier, Julien Gautier, Marc Roulliay, Marc Roulliay, Marie Francoise Ravet, Marie Francoise Ravet, Francoise Bridou, Francoise Bridou, Arnaud Jerome, Arnaud Jerome, "B4C/Mo/Si multilayers for 20-40 nm wavelengths: application to broadband mirrors", Proc. SPIE 5963, Advances in Optical Thin Films II, 59631V (5 October 2005); doi: 10.1117/12.625031; https://doi.org/10.1117/12.625031
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