Translator Disclaimer
19 October 2005 Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step
Author Affiliations +
Abstract
We present a technique for the fabrication of small period structures using a near field holography setup. Using a two-dimensionally structured phase mask, the creation of two-dimensional hole or dot arrays was possible with one single exposure step. In order to get a high contrast interference pattern, the mask parameters were optimized by rigorous calculation to achieve equal transmission efficiency in the respective diffraction orders. The mask generation was done by electron beam lithography and ion beam etching. We have made exposures with two different setups. The first setup is an exposure with normal incidence, where the interference of the four first diffraction orders is used. The second setup uses the zeroth and first diffraction order interference of a conical incident beam.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Hartung, T. Clausnitzer, E.-B. Kley, and A. Tünnermann "Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 596505 (19 October 2005); https://doi.org/10.1117/12.625105
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
Back to Top