VUV spectrophotometry for photomasks characterization at 193 nm

Minghong Yang; Jork Leiterer; Alexandre Gatto; Norbert Kaiser; Ingo Höllein; Silvio Teuber; Karsten Bubke

doi:10.1117/12.625144

19 October 2005 VUV spectrophotometry for photomasks characterization at 193 nm

Minghong Yang, Jork Leiterer, Alexandre Gatto, Norbert Kaiser, Ingo Höllein, Silvio Teuber, Karsten Bubke

Author Affiliations +

Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 59651L (2005) https://doi.org/10.1117/12.625144
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.

Citation Download Citation

Minghong Yang, Jork Leiterer, Alexandre Gatto, Norbert Kaiser, Ingo Höllein, Silvio Teuber, and Karsten Bubke "VUV spectrophotometry for photomasks characterization at 193 nm", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651L (19 October 2005); https://doi.org/10.1117/12.625144

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