Translator Disclaimer
19 October 2005 VUV spectrophotometry for photomasks characterization at 193 nm
Author Affiliations +
Abstract
This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Minghong Yang, Jork Leiterer, Alexandre Gatto, Norbert Kaiser, Ingo Höllein, Silvio Teuber, and Karsten Bubke "VUV spectrophotometry for photomasks characterization at 193 nm", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651L (19 October 2005); https://doi.org/10.1117/12.625144
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top