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11 October 2005 Alignment characterization in micro and nano technologies
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Abstract
The use of lasers as probe sources is very extended in micro and nano technologies. Therefore, the characterization of the beam is critical for the utter development of the measurement. Typically, the beam is projected on the detectors using optical elements and lenses. The alignment procedure is not always very good, and the difficulties increases when infrared radiation is involved. Even with very accurate positioning elements some misalignments are produced. The misalignment is most responsible for the appearance of coma aberration. In the case of a pure Gaussian beam shape they are going to produce a slightly comatic aberrated beam. In this paper we propose a method to characterize the direction and amplitude of this comatic aberration. The method is sensible enough to characterize slightly aberrated beams normally used to deconvolve detector's spatial response. It is based on a statistical analysis of the beam shape in different directions respect to its center. Simulations including the effect of noise are presented too and some applications to micro and nano metrology are exposed.
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José Manuel López-Alonso, Javier Alda, and Glenn Boreman "Alignment characterization in micro and nano technologies", Proc. SPIE 5987, Electro-Optical and Infrared Systems: Technology and Applications II, 59870K (11 October 2005); https://doi.org/10.1117/12.631216
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