7 February 2006 Influence of ion-assisted deposition on laser-induced damage threshold and microstructure of optical coatings
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Abstract
High density, improved adhesion and environmental stability are the main features of dielectric optical coatings produced using ion-assisted deposition (IAD) technology. However, investigations of resistance of IAD coatings to intensive laser radiation show controversial results. A series of experiments were done to examine the influence of ion gun operation on the transmittance of fused silica substrates. It was shown that operation of ion source introduced extinction in UV spectral range. Optical properties of single hafnia layers and multilayer dielectric mirrors deposited using conventional e-beam evaporation and different modes of IAD were investigated. Microstructural analysis using X-ray diffraction (XRD) measurements and AFM scanning of coated areas was carried out. Single hafnia layers deposited using high energy ion assistance had more amorphous structure with smaller crystallites of monoclinic phase. High reflection UV mirrors deposited using high energy ion assistance had slightly higher mean refractive indices of hafnia, higher extinction than conventional e-beam deposition, but demonstrated slightly higher laser induced damage threshold (LIDT) values measured at 355 nm. Deposition using the lowest energy ions produced the most porous coatings with the best LIDT of 7.7 J/cm2.
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G. Abromavicius, R. Buzelis, R. Drazdys, R. Grigonis, A. Melninkaitis, D. Miksys, T. Rakickas, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, A. Selskis, "Influence of ion-assisted deposition on laser-induced damage threshold and microstructure of optical coatings", Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59911F (7 February 2006); doi: 10.1117/12.638709; https://doi.org/10.1117/12.638709
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