5 November 2005 Mobile metrology for advanced photomask manufacturing
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Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59921J (2005); doi: 10.1117/12.632221
Event: SPIE Photomask Technology, 2005, Monterey, California, United States
Abstract
Accuracy and fabrication cost of optical masks continue to be major concerns for the semiconductor industry. While immersion and other process technologies promise to extend optical lithography down to the 45nm node, the resulting technical and commercial requirements for the mask fabrication process become increasingly difficult to achieve. Potential solutions that are readily available to wafer fabricators are either too expensive to deploy or have not been commercialized for mask manufactures- up until now. Mobile metrology has the inherent ability to provide the required measurement accuracy, on any tool, at a low cost of ownership. This paper will discuss the application of a self-contained, wireless SensorPlate for providing process optimization and control within a leading mask blank manufacturing facility. Three critical process steps are characterized: Quartz Cleaning, Chromium Physical Vapor Deposition, and Photoresist Post-Applied Baking. Process optimization was completed to achieve improved performance of the mask blank product.
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Paul MacDonald, Michael P. Goudy, Devi Koty, Henryson Omoregie, M. David Webster, "Mobile metrology for advanced photomask manufacturing", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921J (5 November 2005); doi: 10.1117/12.632221; https://doi.org/10.1117/12.632221
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KEYWORDS
Photomasks

Chromium

Manufacturing

Quartz

Sensors

Temperature metrology

Reticles

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