Applying assist features to improve two dimensional feature process robustness

Lawrence S. Melvin III; Benjamin D. Painter; Levi D. Barnes

doi:10.1117/12.629395

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5 November 2005 Applying assist features to improve two dimensional feature process robustness

Lawrence S. Melvin III, Benjamin D. Painter, Levi D. Barnes

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Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59921N (2005) https://doi.org/10.1117/12.629395
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Sub-resolution assist features are an important tool for improving process robustness for one-dimensional pattern features at advanced manufacturing process nodes. However, sub-resolution assist feature development efforts have not generally considered optimization for process robustness with two-dimensional pattern features. This generally arises both from conservatively placing SRAFs to avoid the possibility of imaging, and from a desire to simplify SRAF placement rules. By studying two-dimensional features using a manufacturing sensitivity model, one can gain insight into the capabilities of SRAFs regarding two-dimensional pattern features. These insights suggest new methodologies for shaping assist features to enhance two-dimensional feature robustness. In addition, a manufacturing sensitivity model form can be employed to optimize the placement of multiple competing SRAFs in localized two-dimensional regions. Initial studies demonstrate significant pullback reduction for two-dimensional features once SRAF placement has been optimized using the manufacturing sensitivity model form.

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Lawrence S. Melvin III, Benjamin D. Painter, and Levi D. Barnes "Applying assist features to improve two dimensional feature process robustness", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921N (5 November 2005); https://doi.org/10.1117/12.629395

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