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7 November 2005 Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting
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Abstract
At SPIE Microlithography 2005, the concept of direct imprinting of dielectric material for dual damascene processing and its benefits was introduced 1. Manufacturing a nano-imprint template with multi-tier 3-D structures presents a unique set of challenges. The main issues are patterning two different mask layers with good overlay and etch depth control into the quartz at each step on the same substrate. This work describes the tools and processes used to build these types of structures in a commercial photomask shop. The results of using a template with two levels of patterning to imprint dual damascene 3-D structures will also be presented.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susan MacDonald, Greg Hughes, Michael Stewart, Frank Palmieri, and C. Grant Willson "Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922F (7 November 2005); https://doi.org/10.1117/12.632312
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