Investigation of sulfate-free clean processes for next generation lithography

Christian Chovino; Stefan Helbig; Petr Haschke; Werner Saule

doi:10.1117/12.632055

8 November 2005 Investigation of sulfate free clean processes for next generation lithography

Christian Chovino, Stefan Helbig, Petr Haschke, Werner Saule

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59923E (2005) https://doi.org/10.1117/12.632055
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Today, haze and crystal growth on the reticle surface are still a primary concern of the microlithography industry. The crystals limit the reticle usage as they result in printable defects on the wafers. Numerous studies have been presented so far. The general belief is that different root causes can lead to crystal growth and haze formation, among them the contaminants on the mask surface from the clean processes. In this paper we are investigating the potential of sulfate free clean processes based on ozonated and hydrogen water for the next generation of photomasks. Key parameters such as cleaning efficiency, as well as the impact of the chemistry on the mask optical properties will be presented. The potential of the chemistry will be discussed and compared to the standard cleaning processes.

Citation Download Citation

Christian Chovino, Stefan Helbig, Petr Haschke, and Werner Saule "Investigation of sulfate free clean processes for next generation lithography", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923E (8 November 2005); https://doi.org/10.1117/12.632055

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