9 November 2005 CW DUV light sources for inspection tools
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Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599243 (2005); doi: 10.1117/12.632101
Event: SPIE Photomask Technology, 2005, Monterey, California, United States
We describe true continuous-wave (CW), high-power, line-narrowed, deep-ultraviolet (DUV) light sources for the high-resolution metrology tools such as wafer inspection and mask inspection systems. The 198.5-nm CW radiation with 300-mW power has also been achieved by sum-frequency mixing (SFM) of 1064-nm output from a single-frequency Yb3+ fiber amplifier with the 244-nm radiation from a frequency-doubled argon-ion laser. The 266-nm CW DUV radiation with 5 W of maximum power has been generated by frequency doubling of 532-nm green laser output. Both sources utilize Brewster-cut CsLiB6O10 (CLBO) crystal for efficient and stable DUV light generation.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Sakuma, Yasuyuki Okada, Tetsumi Sumiyoshi, Hitoshi Sekita, Minoru Obara, "CW DUV light sources for inspection tools", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599243 (9 November 2005); doi: 10.1117/12.632101; https://doi.org/10.1117/12.632101

Deep ultraviolet

Atomic force microscopy


Continuous wave operation

Light sources

Nonlinear crystals

Second-harmonic generation

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