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8 November 2005 Survey of SO4 out gas on mask storage environment
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Abstract
To countermeasure the haze problem on a reticle, we investigated the mask storage environment of wafer manufacturing Fab and mask manufacturing Fab. Through IC (Ion chromatography) and AIM system, we measured the outgas quantities of Fab environment, SMIF pod, mask carrier boxes and pellicle. With the evaluation result, the environmental factors around the production mask do not meet the level of its residual SO4 ion. We suggested the imminent priority to improve the environment surrounding the production masks. Additionally, we adopted a new process to decrease the SO4 outgas of pellicle frame up to 90%.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Sik Lee, Sung Bae Jee, Sung Min Hwang, Hyun Yul Park, and Oscar Han "Survey of SO4 out gas on mask storage environment", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599248 (8 November 2005); https://doi.org/10.1117/12.626243
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