Survey of SO<sub>4</sub> outgas on mask storage environment

Jun Sik Lee; Sung Bae Jee; Sung Min Hwang; Hyun Yul Park; Oscar Han

doi:10.1117/12.626243

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8 November 2005 Survey of SO₄ out gas on mask storage environment

Jun Sik Lee, Sung Bae Jee, Sung Min Hwang, Hyun Yul Park, Oscar Han

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Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599248 (2005) https://doi.org/10.1117/12.626243
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

To countermeasure the haze problem on a reticle, we investigated the mask storage environment of wafer manufacturing Fab and mask manufacturing Fab. Through IC (Ion chromatography) and AIM system, we measured the outgas quantities of Fab environment, SMIF pod, mask carrier boxes and pellicle. With the evaluation result, the environmental factors around the production mask do not meet the level of its residual SO₄ ion. We suggested the imminent priority to improve the environment surrounding the production masks. Additionally, we adopted a new process to decrease the SO₄ outgas of pellicle frame up to 90%.

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Jun Sik Lee, Sung Bae Jee, Sung Min Hwang, Hyun Yul Park, and Oscar Han "Survey of SO₄ out gas on mask storage environment", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599248 (8 November 2005); https://doi.org/10.1117/12.626243

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