8 November 2005 Image placement accuracy of single-membrane stencil masks for e-beam lithography
Author Affiliations +
Abstract
Three stencil masks with simple die layouts on 24 mm x 24 mm Si membranes are made to compare simulation and experiment on image placement (IP). A pseudo finite element (FE) modeling is adopted. Displacements predicted by simulation are found to be smaller than experimental values, but both agree qualitatively. Four stencil masks with die layouts that model on ULSI hole layers in 30% opening ratio and pattern arrangement are successfully made. Displacements are reduced to 1/4 by adopting IP correction. The IP correction of EB data is found to be a useful method of reducing IP error.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Minoru Kitada, Minoru Kitada, Satoshi Yusa, Satoshi Yusa, Naoko Kuwahara, Naoko Kuwahara, Hiroshi Fujita, Hiroshi Fujita, Tadahiko Takikawa, Tadahiko Takikawa, Hisatake Sano, Hisatake Sano, Morihisa Hoga, Morihisa Hoga, } "Image placement accuracy of single-membrane stencil masks for e-beam lithography", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924R (8 November 2005); doi: 10.1117/12.630114; https://doi.org/10.1117/12.630114
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

200-mm EPL stencil mask fabrication and metrology
Proceedings of SPIE (December 16 2003)
1x stencil masks fabrication and their use in Low Energy...
Proceedings of SPIE (December 05 2004)
Local IP evaluations of EPL reticle with 4 mm sq...
Proceedings of SPIE (June 27 2005)
Reduction of image placement errors in EPL masks
Proceedings of SPIE (June 15 2003)
Evaluation of image placement of EPL stencil masks
Proceedings of SPIE (August 19 2004)

Back to Top