In-Line Far-Field Holography And Diffraction Pattern Analysis : New Developments

C. Ozkul; D. Allano; M. Trinite; N. Anthore

doi:10.1117/12.952439

30 June 1986 In-Line Far-Field Holography And Diffraction Pattern Analysis : New Developments

C. Ozkul, D. Allano, M. Trinite, N. Anthore

Proceedings Volume 0600, Progress in Holographic Applications; (1986) https://doi.org/10.1117/12.952439
Event: 1985 International Technical Symposium/Europe, 1985, Cannes, France

Abstract

A holographic recording with a filter is studied. In particular, influences of the hologram finite aperture on filtered images are considered. Irradiance distribution in defocused image is calculated. Furthermore in application an instrument measuring the diameter and 3-D position of a glass fiber is described.

Citation Download Citation

C. Ozkul, D. Allano, M. Trinite, and N. Anthore "In-Line Far-Field Holography And Diffraction Pattern Analysis : New Developments", Proc. SPIE 0600, Progress in Holographic Applications, (30 June 1986); https://doi.org/10.1117/12.952439

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