22 November 2005 Nanoimprint lithography: review of aspects and applications
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Abstract
Nanoimprint lithography is a relatively new area of study in nanotechnology. Higher resolution patterning can be achieved with nanoimprint lithography than with light diffraction or beam scattering in photoresists. Nanoimprint lithography is a generic term for nano-scale pattern transfer using embossing techniques. These techniques introduce new problems such as: nano-scale alignment, nanovoids and adhesion to the mold. The pattern is typically created in a mold using e-beam writing in photoresist on a substrate and dry etching to transfer the pattern to the mold. A low wattage dry etching process is preferred as to create as smooth a surface as possible to reduce the likelihood of polymers adhering to the mold surface. These molds are generally very durable and can be used repeatedly. Once the mold is created, an anti-sticking coating is often applied to prevent photoresist adhesion. There have been a variety of parameters used to emboss the patterns in photoresists using elevated temperature, room temperature, single and multiple layers of photoresists to name a few. This article reviews some of the current methods of creating nano-scale geometries and will include some areas of application. It will also discuss examples of achieved resolutions and the difficulties in producing them.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. J. Wagner, D. J. Wagner, A. H. Jayatissa, A. H. Jayatissa, } "Nanoimprint lithography: review of aspects and applications", Proc. SPIE 6002, Nanofabrication: Technologies, Devices, and Applications II, 60020R (22 November 2005); doi: 10.1117/12.631046; https://doi.org/10.1117/12.631046
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