Status of nanoimprint lithography and device applications

Jian Jim Wang

doi:10.1117/12.630002

25 October 2005 Status of nanoimprint lithography and device applications

Jian Jim Wang

Proceedings Volume 6013, Optoelectronic Devices: Physics, Fabrication, and Application II; 601302 (2005) https://doi.org/10.1117/12.630002
Event: Optics East 2005, 2005, Boston, MA, United States

Abstract

Based on mechanical replication, nanoimprint lithography is an emerging technology that can achieve lithographic resolutions beyond the limitations set by light diffractions or beam scatterings in conventional lithographic techniques, while promising high-throughput patterning. This tutorial paper reviews the status and some of the recent progress in the commercial applications of this technology.

Citation Download Citation

Jian Jim Wang "Status of nanoimprint lithography and device applications", Proc. SPIE 6013, Optoelectronic Devices: Physics, Fabrication, and Application II, 601302 (25 October 2005); https://doi.org/10.1117/12.630002

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available