Paper
2 December 2005 Leakage current analysis in AlGaInP/GaInP multi-quantum well lasers by the electrical derivative method
Yun Xu, Yuzhang Li, Guofeng Song, Qiaoqiang Gan, Qing Cao, Liang Guo, Lianghui Chen
Author Affiliations +
Proceedings Volume 6020, Optoelectronic Materials and Devices for Optical Communications; 60202F (2005) https://doi.org/10.1117/12.636130
Event: Asia-Pacific Optical Communications, 2005, Shanghai, China
Abstract
In AlGaInP/GaInP multi-quantum well (MQW) lasers, the electron leakage current is a much more serious problem than that in laser diodes with longer wavelength. To further improve the output performance, the leakage current should be analyzed. In this letter, the temperature dependence of electrical derivative characteristics in AlGaInP/GaInP multi-quantum well lasers was measured, and the potential barrier for electron leakage was obtained. With the help of secondary ion mass spectroscopy (SIMS) measurement, theoretical analysis of the potential barrier was presented and compared with the measurement result. The influence of p-cladding doping level and doping profile on the potential barrier was discussed, and this can be helpful in metalorganic chemical vapor deposition (MOCVD) growth.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yun Xu, Yuzhang Li, Guofeng Song, Qiaoqiang Gan, Qing Cao, Liang Guo, and Lianghui Chen "Leakage current analysis in AlGaInP/GaInP multi-quantum well lasers by the electrical derivative method", Proc. SPIE 6020, Optoelectronic Materials and Devices for Optical Communications, 60202F (2 December 2005); https://doi.org/10.1117/12.636130
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Semiconductor lasers

Metalorganic chemical vapor deposition

Aluminium gallium indium phosphide

Chemical analysis

Temperature metrology

Doping

Ions

RELATED CONTENT


Back to Top