Effects of magnetic field on the structural and optical properties of nanocrystalline silicon thin films deposited by helicon wave plasma chemical vapor deposition

Wei Yu; Li Zhang; Baozhu Wang; Xiaoxia Han; Wei Sun; Guangsheng Fu

doi:10.1117/12.636742

5 December 2005 Effects of magnetic field on the structural and optical properties of nanocrystalline silicon thin films deposited by helicon wave plasma chemical vapor deposition

Wei Yu, Li Zhang, Baozhu Wang, Xiaoxia Han, Wei Sun, Guangsheng Fu

Author Affiliations +

Proceedings Volume 6020, Optoelectronic Materials and Devices for Optical Communications; 60203C (2005) https://doi.org/10.1117/12.636742
Event: Asia-Pacific Optical Communications, 2005, Shanghai, China

Abstract

Hydrogenated nanocrystalline silicon thin films have been deposited by helicon wave plasma chemical vapor deposition technique over the range of magnetic field strength (0-200Guass) using a mixture of silane and hydrogen gas. The effects of magnetic field on the structural and optical properties of the deposited films are characterized by Raman spectroscopy, x-ray diffraction and ultraviolet-visible transmittance spectroscopy. It has been found that the crystalline fraction and optical band gap E_g of the films change with magnetic field strength monotonically, while the deposition rate, the grain size and the B factor relating to the overall structural disorder reach a maximal value at 150 Guass. The variation of Raman scattering intensity ratio between silicon TA and TO mode indicates that the inner microstructure of the films becomes more orderly with increasing magnetic field strength until 150 Guass. The decrease trend of the optical band gap E_g and the changes of the B value with magnetic field strength from the ultraviolet-visible transmittance spectroscopy analysis are related to the increase of the grain size, the crystalline fraction and the hydrogen. The observed results have been discussed by the increase of hydrogen weak bond etching and dangling bond passivating effect with increasing magnetic field strength.

Citation Download Citation

Wei Yu, Li Zhang, Baozhu Wang, Xiaoxia Han, Wei Sun, and Guangsheng Fu "Effects of magnetic field on the structural and optical properties of nanocrystalline silicon thin films deposited by helicon wave plasma chemical vapor deposition", Proc. SPIE 6020, Optoelectronic Materials and Devices for Optical Communications, 60203C (5 December 2005); https://doi.org/10.1117/12.636742

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Magnetism

Crystals

Hydrogen

Silicon

Plasma

Raman spectroscopy

Silicon films

Show All Keywords

Keywords/Phrases

Search In:

Publication Years