9 December 2005 Determining thin film thickness characterization using adaptive simulated annealing algorithm
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Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 602416 (2005) https://doi.org/10.1117/12.666850
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
Thin film is very important in many industries. To perform the functions for which they were designed, the films must have proper thickness, roughness and other characteristics. These characteristics must often be measured, both during and after fabrication. Optical methods used to determining the characteristics of films are usually preferred because they are accurate, nondestructive and require little or no sample preparing. This paper introduces a new method of determining the thickness of thin films using Adaptive Simulated Annealing (ASA) algorithm. Based on the theory of thin film calculating, it uses the spectral reflectance data with the incident light perpendicular to the sample surface over a range of wavelengths to calculate the thickness of thin film. ASA is selected as a global optimization algorithm to characterize the thickness of thin film because it is good at dealing with the multimodal and nonsmooth cost function and it can converge quickly and accurately. The thicknesses of four thin film systems are calculated out to testify the correctness and efficiency of the method and the results are satisfying.
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Yanping Chen, Yuling Liu, Peng Liu, Yingbo He, Feihong Yu, "Determining thin film thickness characterization using adaptive simulated annealing algorithm", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 602416 (9 December 2005); doi: 10.1117/12.666850; https://doi.org/10.1117/12.666850
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