9 December 2005 A novel method for measuring the thickness of optical wave plate
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Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 60241B (2005) https://doi.org/10.1117/12.666856
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
Based on chromatic polarization interferometry, a novel method for measuring the thickness of optical wave plate is presented. When the resolution power of spectrometer reaches 0.01nm, the measuring precision of the thickness is better than 0.1μm.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weiwei Feng, Weiwei Feng, Lihuang Lin, Lihuang Lin, } "A novel method for measuring the thickness of optical wave plate", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60241B (9 December 2005); doi: 10.1117/12.666856; https://doi.org/10.1117/12.666856
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