9 December 2005 A novel method for measuring the thickness of optical wave plate
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Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 60241B (2005) https://doi.org/10.1117/12.666856
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
Based on chromatic polarization interferometry, a novel method for measuring the thickness of optical wave plate is presented. When the resolution power of spectrometer reaches 0.01nm, the measuring precision of the thickness is better than 0.1μm.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weiwei Feng, Lihuang Lin, "A novel method for measuring the thickness of optical wave plate", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60241B (9 December 2005); doi: 10.1117/12.666856; https://doi.org/10.1117/12.666856
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