20 January 2006 Transverse-adding fabrication technique of binary element and alignment error analysis
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Proceedings Volume 6027, ICO20: Optical Information Processing; 60273W (2006) https://doi.org/10.1117/12.668386
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
On the basis of close analysis of the drawback in conventional fabrication techniques of binary optical element, this paper presents a new method for fabricating optical element. This method can be called transverse-adding fabrication technique(TAFT), and it is developed from the rapid prototyping technique used in microelectronic processing and micro-machining. The principal objective developing this technique is to realize the compatibility of micro-optics with microelectronics and micro-machining technique to provide technical support for the integrated single-chip micro photo-electromechanical system. An explanation for the technological principle and process of this technique is stated. By analyzing experimental data, the selection of materials and corresponding process parameters for implementing this technique were determined. The main process error of this technique, alignment error, was analyzed and calculated. In addition, a computerized simulation was carried out. Analysis shows that this technique can not only fabricate continuous phase component, its diffraction efficiency is insensitive to the alignment error as well. It is therefore clear that the transverse-adding fabrication technique is a feasible technique for fabricating binary optical elements and has an advantage over conventional techniques in fabricating precision.
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Min Chen, Daxiang Yu, Yiqing Gao, Shenglin Yu, "Transverse-adding fabrication technique of binary element and alignment error analysis", Proc. SPIE 6027, ICO20: Optical Information Processing, 60273W (20 January 2006); doi: 10.1117/12.668386; https://doi.org/10.1117/12.668386
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