Plasma properties of a new-type surface wave-sustained plasma source under the conditions of depositing DLC films

Junqi Xu; Hiroyuki Kousaka; Noritsugu Umehara; Dongfeng Diao

doi:10.1117/12.667689

23 January 2006 Plasma properties of a new-type surface wave-sustained plasma source under the conditions of depositing DLC films

Junqi Xu, Hiroyuki Kousaka, Noritsugu Umehara, Dongfeng Diao

Author Affiliations +

Proceedings Volume 6029, ICO20: Materials and Nanostructures; 60290L (2006) https://doi.org/10.1117/12.667689
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

Surface wave-sustained plasma (SWP) is one of the low-pressure, high- density plasma. Applying this technique, diamond-like carbon (DLC) films with excellent characteristics can be prepared by physical vapor deposition (PVD) method. However, the films' application is restricted in some degree, because it is difficult to control the film properties. In this paper, SWP was excited along a conductive rod at a frequency of 2.45 GHz without magnetic fields around the chamber wall. The fundamental theories of plasma diagnostic were presented and plasma properties were studied with a Langmuir probe under the conditions of depositing DLC films by PVD method with a graphite target. Plasma density, electron temperature, plasma potential and target current were measured at difference technique parameters such as gas pressure, microwave power, and so on. As a result, it was proved that plasma properties are greatly affected by microwave power, target voltage and argon gas pressure in chamber. The gas mass flow rate had almost no effect on plasma characters. At the same time, the results indicated that electron density is up to 10¹¹-10¹²cm^-3 even at the low pressure of 1 Pa.

Citation Download Citation

Junqi Xu, Hiroyuki Kousaka, Noritsugu Umehara, and Dongfeng Diao "Plasma properties of a new-type surface wave-sustained plasma source under the conditions of depositing DLC films", Proc. SPIE 6029, ICO20: Materials and Nanostructures, 60290L (23 January 2006); https://doi.org/10.1117/12.667689

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