1 February 2006 The optical properties of titanium oxide films prepared by dc reactive magnetron sputtering
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Proceedings Volume 6034, ICO20: Optical Design and Fabrication; 603409 (2006) https://doi.org/10.1117/12.668092
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
Abstract
TiO2 thin films were deposited on the glass substrates by dc reactive magnetron sputtering technique at different sputtering pressures. The films prepared at low pressures have an anatase phase, and the films prepared at high pressures have an amorphous phase. The optical properties were studied by measuring the transmittance and the ellipsometric spectra. The optical constants of the films in the visible range were obtained by fitting the transmittance combined with the ellipsometry measurements using the classical model with one oscillator. The films prepared at the pressure higher than 6 x 10-3 mbar show a volume inhomogeneity. This volume inhomogeneity has been calculated by fitting the transmittance and the ellipsometric spectra.
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Li-Jian Meng, Li-Jian Meng, V. Teixeira, V. Teixeira, H. N. Cui, H. N. Cui, Frank Placido, Frank Placido, Z. Xu, Z. Xu, M. P. dos Santos, M. P. dos Santos, } "The optical properties of titanium oxide films prepared by dc reactive magnetron sputtering", Proc. SPIE 6034, ICO20: Optical Design and Fabrication, 603409 (1 February 2006); doi: 10.1117/12.668092; https://doi.org/10.1117/12.668092
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