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28 December 2005 Nanosieves fabricated by interference lithography and electroforming
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Self-sustaining Nickel membranes with periodic and regular distribution of pores, in the scale of hundred of nanometers, were produced by interference lithography and electroplating. The process consists in the recording of submicrometric 2D periodic photoresist columns, on a metal-coated glass substrate, using the double exposure of an interference fringe pattern. As the photoresist is a good electrical isolator, when the sample is immersed in a Ni electroplating bath, the array of photoresist columns impedes the Nickel deposition in the patterned areas. A nickel film is then growth among the photoresist columns with a thickness up to 80 % of the height of the columns. In order to release the submicrometric membrane from the substrate, a thick hexagonal Nickel sustaining structure is electroformed, using conventional photolithography. The dimensions of the sustaining structure can be adapted in order to fulfill the pressure requirements of the filtration system. The good uniformity of the pore sizes as well as the smooth of the surface make such devices very interesting for separation of particles by size in filtration systems.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luis E. Gutierrez-Rivera, Edson J. de Carvalho, Maria A. da Silva, and Lucila Cescato "Nanosieves fabricated by interference lithography and electroforming", Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 603710 (28 December 2005);

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