Paper
3 January 2006 RF magnetron sputter deposition and analysis of strontium-doped lead zirconate titanate thin films
Author Affiliations +
Proceedings Volume 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV; 603723 (2006) https://doi.org/10.1117/12.668052
Event: Microelectronics, MEMS, and Nanotechnology, 2005, Brisbane, Australia
Abstract
The paper investigates conditions for depositing perovskite-oriented strontium-doped lead zirconate titanate (PSZT) thin films using RF magnetron sputtering. PSZT is a material that can exhibit high piezoelectric and ferroelectric properties. The deposition was conducted using an 8/65/35 PSZT sputtering target. The effects of sputtering conditions and the deposition rates for films sputtered onto several surfaces (including gold and platinum coated substrates) were studied. Combinations of in-situ heating during sputtering and post-deposition Rapid Thermal Annealing (RTA) were performed and resulting phases determined. RTA was carried out in argon to observe their effects. The sputtered films were analyzed by Scanning Electron Microscopy (SEM), X-ray Diffractometry (XRD), and X-Ray Photoelectron Spectroscopy (XPS). Results show dramatic differences in the grain structure of the deposited films on the different surfaces. The stoichiometry of the sputtered films is demonstrated using XPS. In the case of gold and platinum coated substrates, sputtering was also carried out for different durations, to establish the growth rate of the film, and to observe the variation in grain size with sputtering duration. The deposited thin films were resistant to most chemical wet etchants and were Ion Beam Etched (IBE) at 19 nm/min.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sharath Sriram, Madhu Bhaskaran, Anthony S. Holland, Ernest Fardin, and Sasikaran Kandasamy "RF magnetron sputter deposition and analysis of strontium-doped lead zirconate titanate thin films", Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 603723 (3 January 2006); https://doi.org/10.1117/12.668052
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KEYWORDS
Sputter deposition

Platinum

Gold

Scanning electron microscopy

Ferroelectric materials

Perovskite

Thin films

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