10 February 2006 Waveguide fabrication by ionic interchange with different methods
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Proceedings Volume 6046, Fifth Symposium Optics in Industry; 604607 (2006) https://doi.org/10.1117/12.674414
Event: Fifth Symposium Optics in Industry, 2005, Santiago De Queretaro, Mexico
Abstract
In this work we present the fabrication process of channel waveguides by ionic exchange on a glass substrate. To delimit the channel areas on the glass substrate two procedures are used. The first one is by conventional lithography, making use of an aligner, photoresist and a mask. The second consists in implementing a holographic interferometer to imprint on the photoresist layered substrate, a straight fringes interference pattern of desired period. The glass index increasing in the channels area is obtained by Na+/K+ ionic interchange. We present the near field characterization results of the waveguides fabricated by the conventional method; as well as results of the parameters optimization and grids, fabricated by the holographic method.
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P. Barrios, P. Barrios, A. Rodríguez, A. Rodríguez, S. Guel, S. Guel, G. Ramírez, G. Ramírez, } "Waveguide fabrication by ionic interchange with different methods", Proc. SPIE 6046, Fifth Symposium Optics in Industry, 604607 (10 February 2006); doi: 10.1117/12.674414; https://doi.org/10.1117/12.674414
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