Nanoimprint technology for application to photonic devices

Masashi Nakao; Shiyoshi Yokoyama; Hideki Masuda

doi:10.1117/12.649216

5 December 2005 Nanoimprint technology for application to photonic devices

Masashi Nakao, Shiyoshi Yokoyama, Hideki Masuda

Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 605001 (2005) https://doi.org/10.1117/12.649216
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan

Abstract

We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.

Citation Download Citation

Masashi Nakao, Shiyoshi Yokoyama, and Hideki Masuda "Nanoimprint technology for application to photonic devices", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 605001 (5 December 2005); https://doi.org/10.1117/12.649216

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