5 December 2005 Multi-scale soft-lithographic lift-off and grafting (MS-SLLOG) process for active polymer nanophotonic device fabrication
Author Affiliations +
Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 605002 (2005) https://doi.org/10.1117/12.649044
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan
Abstract
This paper reports a new microfabrication process named "Multi-Scale Soft-Lithographic Lift-Off and Grafting (MS-SLLOG)" used to construct active nanophotonic devices. MS-SLLOG is a low-temperature (less than 150°C) microfabrication technique that allows soft lithographically molded polymer micro-structures to be integrated together with silicon-based microelectromechanical systems (MEMS) structures to perform active control. Moreover, MS-SLLOG process allows us to achieve a hierarchical device structure seamlessly accommodating feature sizes ranging from tens of nanometer to sub-millimeters on a single chip for nanophotonic structure integration. To demonstrate the MS-SLLOG process capability, a strain-controlled micro-optical grating device is fabricated and experimentally characterized. The experimental results successfully show the operation of an active polymer nanophotonic device fabricated by the MS-SLLOG process.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi-Chung Tung, Steven C. Truxal, Katsuo Kurabayashi, "Multi-scale soft-lithographic lift-off and grafting (MS-SLLOG) process for active polymer nanophotonic device fabrication", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 605002 (5 December 2005); doi: 10.1117/12.649044; https://doi.org/10.1117/12.649044
PROCEEDINGS
10 PAGES


SHARE
Back to Top