5 December 2005 Nanofabrication by direct laser writing and holography (Invited Paper)
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Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 60500S (2005) https://doi.org/10.1117/12.660605
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan
Abstract
The physical principles underlying a three-dimensional (3D) laser microstructuring technique are outlined, its applications for the fabrication of 3D (nano)micro-structured materials are presented. The direct laser writing and holographic recording in SU-8 photoresist are described. The limits of the lateral and axial light localization of a Gaussian pulse/beam at the focus are derived for the multi-photon absorption taking into account the threshold of photomodification. Prospective holographic patterns formed by interference of circularly and linearly polarized beams are discussed.
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Kock Khuen Seet, Vygandas Jarutis, Saulius Juodkazis, Hiroaki Misawa, "Nanofabrication by direct laser writing and holography (Invited Paper)", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 60500S (5 December 2005); doi: 10.1117/12.660605; https://doi.org/10.1117/12.660605
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