5 December 2005 Nanofabrication by direct laser writing and holography (Invited Paper)
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Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 60500S (2005) https://doi.org/10.1117/12.660605
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan
The physical principles underlying a three-dimensional (3D) laser microstructuring technique are outlined, its applications for the fabrication of 3D (nano)micro-structured materials are presented. The direct laser writing and holographic recording in SU-8 photoresist are described. The limits of the lateral and axial light localization of a Gaussian pulse/beam at the focus are derived for the multi-photon absorption taking into account the threshold of photomodification. Prospective holographic patterns formed by interference of circularly and linearly polarized beams are discussed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kock Khuen Seet, Vygandas Jarutis, Saulius Juodkazis, Hiroaki Misawa, "Nanofabrication by direct laser writing and holography (Invited Paper)", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 60500S (5 December 2005); doi: 10.1117/12.660605; https://doi.org/10.1117/12.660605

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