5 December 2005 Selective erasure for multiplexed holograms in photorefractive crystal using phase conjugate mirror
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Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 60500X (2005) https://doi.org/10.1117/12.648792
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan
Abstract
In this paper, we propose a selective erasure method for multiplexed holograms in a photorefractive crystal using a phase conjugate mirror (PCM). In this method, for the accurate selective erasure, we use pai phase shift between the relative phase of the diffracted beam to the transmitted beam by the hologram in photorefractive crystal and the relative phase of the object beam to reference beam in recording process by setting the direction of c-axis to the appropriate direction. In the selective erasure process, the diffracted beam and the transmitted beam by the original hologram in main memory are returned to main memory by PCM. These returned beams automatically propagate through the strictly same pass as the diffracted beam and the transmitted beam. Furthermore, by these returned beams, the pi-phase shifted hologram is overwritten on the original hologram by setting c-axis of main memory to the appropriate direction. Therefore, the pi-phase shifted hologram is automatically overwritten on the strictly same position as the original hologram without the high precise alignment and the original hologram is selectively erased. We perform the analysis and the experiment on selective erasure and demonstrate that one of the multiplexed holograms is selectively erased with our method.
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Takayuki Sano, Atsushi Okamoto, Kunihiro Sato, Masatoshi Bunsen, "Selective erasure for multiplexed holograms in photorefractive crystal using phase conjugate mirror", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 60500X (5 December 2005); doi: 10.1117/12.648792; https://doi.org/10.1117/12.648792
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