9 June 2006 Large aperture excimer laser system
Author Affiliations +
Proceedings Volume 6053, International Conference on Lasers, Applications, and Technologies 2005: High-Power Lasers and Applications; 605304 (2006); doi: 10.1117/12.659681
Event: International Conference on Lasers, Applications, and Technologies 2005, 2005, St. Petersburg, Russian Federation
Abstract
A 300 J/210 ns XeCl laser system has been developed. Five lasers in MOPA chains characterized by different pumping techniques are described. Also, the main experimental results of the Photons are given.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. Losev, J. Liu, "Large aperture excimer laser system", Proc. SPIE 6053, International Conference on Lasers, Applications, and Technologies 2005: High-Power Lasers and Applications, 605304 (9 June 2006); doi: 10.1117/12.659681; https://doi.org/10.1117/12.659681
PROCEEDINGS
6 PAGES


SHARE
KEYWORDS
Capacitors

Diodes

Laser systems engineering

Electrodes

Excimer lasers

Pulsed laser operation

Semiconductor lasers

RELATED CONTENT


Back to Top