New halftoning methods combining the best of masking and error diffusion algorithms

Ferruccio Cittadini; Jacque Pervillé; Stéphane Berche; Mohamed Ben Chouikha; Georges Alquié

doi:10.1117/12.642289

16 January 2006 New halftoning method combining the best of masking and error diffusion algorithms

Ferruccio Cittadini, Jacque Pervillé, Stéphane Berche, Mohamed Ben Chouikha, Georges Alquié

Proceedings Volume 6058, Color Imaging XI: Processing, Hardcopy, and Applications; 60580Z (2006) https://doi.org/10.1117/12.642289
Event: Electronic Imaging 2006, 2006, San Jose, California, United States

Abstract

There are two main families among the halftoning methods: halftoning by masking (i.e. blue noise masking) and error diffusion halftoning. The first family produces neither "worms" nor defects related to stationary regimes but has a limited spatial bandwidth. The error diffusion halftoning method is characterized by a very broad spatial bandwidth allowing good rendition of very thin lines and patterns but this method presents sometimes unpleasant worms or stationary regimes. These methods are complementary with respect to quality. In this paper we propose a halftoning algorithm in black and white, derived from the error diffusion of Floyd Steinberg. By using a new threshold modulation, our new method combines the advantages of both masking and error diffusion algorithms. In order to evaluate our algorithm we defined a set of test images allowing the evaluation of the critical points of quality for the technical imagery: graininess, patterning and spatial bandwidth. The rendering of the presented algorithm has low graininess, no unpleasant patterning and broad spatial bandwidth.

Citation Download Citation

Ferruccio Cittadini, Jacque Pervillé, Stéphane Berche, Mohamed Ben Chouikha, and Georges Alquié "New halftoning method combining the best of masking and error diffusion algorithms", Proc. SPIE 6058, Color Imaging XI: Processing, Hardcopy, and Applications, 60580Z (16 January 2006); https://doi.org/10.1117/12.642289

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KEYWORDS

Diffusion

Modulation

Optical lithography

Error analysis

Photography

Raster graphics

Detection and tracking algorithms

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