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23 February 2006 Nonlinear lens mapping of optical substrates
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Abstract
We have tested a technique for characterizing optical substrates using high sensitivity of the constant of nonlinear refraction to the structural and compositional homogeneity of the material. The technique consists in two steps: first the substrate is positioned in the focal region of a lens where the signal of the nonlinear phase shift is maximal and, second, the substrate is scanned in directions transverse to the propagation direction of the probe laser beam. The measured variations are proportional to variations in the nonlinear phase shift across the substrate and reflect distribution of parameters that contribute into the nonlinear phase shift, including the absorption coefficient and substrate thickness. This technique can be used for mapping trace amounts of impurities, dopants and inclusions as well as varying external/boundary conditions in glass substrates, liquid crystals, and other materials. As an example, we have visualized subtle changes inflicted on a holographic glass by UV exposure.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sarik R. Nersisyan D.D.S., Nelson V. Tabiryan, Leonid B. Glebov, and Larissa N. Glebova "Nonlinear lens mapping of optical substrates", Proc. SPIE 6101, Laser Beam Control and Applications, 61011I (23 February 2006); https://doi.org/10.1117/12.646567
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