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23 February 2006 Adaptive modeling of the femtosecond inscription in silica
Vladimir Mezentsev, Jovana Petrovic, Jürgen Dreher, Rainer Grauer
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Abstract
We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir Mezentsev, Jovana Petrovic, Jürgen Dreher, and Rainer Grauer "Adaptive modeling of the femtosecond inscription in silica", Proc. SPIE 6107, Laser-based Micropackaging, 61070R (23 February 2006); https://doi.org/10.1117/12.647303
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Cited by 7 scholarly publications.
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KEYWORDS
Plasma

Femtosecond phenomena

Silica

Absorption

Dispersion

Ionization

Refractive index

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