23 February 2006 Laser-nanostructure interactions and applications for parallel nanomanufacturing
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An aggressive pursuit for ever decreasing the minimum feature size in modern integrated circuit has lead to various challenges in nanofabrication. Finer feature size is very desirable in microelectronics and other applications for higher performance. However, it is difficult to achieve critical dimensions at sub-wavelength scale using traditional optical lithography techniques due to the optical diffraction limit. We developed several techniques to overcome this diffraction limit and simultaneously achieve massive, parallel patterning. One of the methods involves the principle of optical near-field enhancement between the spheres and substrate when irradiated by a laser beam, for obtaining the nano-features. Nonlinear absorption of the enhanced optical field between the spheres and substrate sample was believed to be the primary reason for the creation of nano-features. Also, we utilized the near-field enhancement around nanoridges and nanotips upon pulsed laser irradiation to produce line or dot patterns in nanoscale on gold thin films deposited on glass substrates. We demonstrated that the photolithography can be extended to a sub-wavelength resolution for patterning any substrate by exciting the surface plasmons on both metallic mask and a shield layer covering the substrate. We used laser-assisted photothermal imprinting method for directly nanopatterning carbon nanofiber-reinforced polyethylene nanocomposite.
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Arvind Battula, Arvind Battula, Dongbing Shao, Dongbing Shao, Yi Lu, Yi Lu, Shaochen Chen, Shaochen Chen, "Laser-nanostructure interactions and applications for parallel nanomanufacturing", Proc. SPIE 6107, Laser-based Micropackaging, 61070F (23 February 2006); doi: 10.1117/12.648735; https://doi.org/10.1117/12.648735

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