23 February 2006 Adaptive modeling of the femtosecond inscription in silica
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We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.
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Vladimir Mezentsev, Jovana Petrovic, Jürgen Dreher, Rainer Grauer, "Adaptive modeling of the femtosecond inscription in silica", Proc. SPIE 6107, Laser-based Micropackaging, 61070R (23 February 2006); doi: 10.1117/12.647303; https://doi.org/10.1117/12.647303

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