23 February 2006 Adaptive modeling of the femtosecond inscription in silica
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Proceedings Volume 6107, Laser-based Micropackaging; 61070R (2006); doi: 10.1117/12.647303
Event: Lasers and Applications in Science and Engineering, 2006, San Jose, California, United States
Abstract
We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.
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Vladimir Mezentsev, Jovana Petrovic, Jürgen Dreher, Rainer Grauer, "Adaptive modeling of the femtosecond inscription in silica", Proc. SPIE 6107, Laser-based Micropackaging, 61070R (23 February 2006); doi: 10.1117/12.647303; https://doi.org/10.1117/12.647303
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KEYWORDS
Plasma

Femtosecond phenomena

Silica

Absorption

Dispersion

Ionization

Refractive index

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