Paper
1 March 2006 Pulsed selective laser removal of nano- and micro-particles
Author Affiliations +
Abstract
Selective laser removal of micro-particles of one chemical composition from their mixture with micro-particles of another chemical type pre-deposited on hydrophobic or hydrophilic surfaces have been demonstrated by means of steam laser cleaning method realized with nanosecond IR laser and various liquid energy transfer media (ETM). Microscopic imaging of particle mixture deposition, ETM dosing and final particle removal has been performed with the help of timeresolved optical microscopy. Optimal ETM/particle combinations for selective targeting and removal of specific particles from their mixture on the surfaces have been revealed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shishir Shukla, Sergey I. Kudryashov, Kevin Lyon, and Susan D. Allen "Pulsed selective laser removal of nano- and micro-particles", Proc. SPIE 6107, Laser-based Micropackaging, 61070S (1 March 2006); https://doi.org/10.1117/12.647056
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Particles

Silicon

Gas lasers

Stanford Linear Collider

Microscopes

Pulsed laser operation

Carbon monoxide

RELATED CONTENT

Laser-induced particle removal from silicon wafers
Proceedings of SPIE (August 16 2000)
Laser cleaning of silicon wafers: mechanisms and efficiencies
Proceedings of SPIE (February 25 2002)
Whole wafer critical point drying of MEMS devices
Proceedings of SPIE (October 02 2001)
Laser cleaning of silicon membrane stencil masks
Proceedings of SPIE (February 03 2000)

Back to Top